A. Mouskeftaras and Y. Bellouard, "Effect of the Combination of Femtosecond Laser Pulses Exposure on the Etching Rate of Fused Silica in Hydrofluoric Acid," Journal of Laser Micro/Nanoengineering 13, 26–30 (2018).
 
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The paper presents an experimental study of the laser-assisted wet etching of fused Silica. We
investigate the mechanisms behind the increased etching rate of laser-exposed regions and use a combined laser pulse as a mean for obtaining better etching rate contrast between pristine and laser-modified silica. This combined pulse consists of two orthogonally polarized pulses with a fixed delay between them. For this purpose, we use a 150 fs laser operating at 1030 nm and 100 kHz repetition rate integrated in a simple experimental setup where the beam is further divided in two paths, onto which independent laser parameters can be applied. Our results emphasize the role of matrix defects, causing fluorescent emission, in the accelerated etching rate of laser-modified
material
. (Download / PDF)